Hysitron's nanoDMA III features:
- Newly developed CMX algorithms, providing a truly Continuous Measurement of X (X = hardness, storage modulus, loss modulus, complex modulus, tan-delta, etc.) as a function of contact depth, frequency and time
- Universally applicable technique for the thorough nanoscale characterization materials, from ultra-soft hydrogels to hard coatings
- High bandwidth electronics for a greatly improved signal to noise ratio and faster testing cycles
- Enhanced dynamic characteristics and dynamic testing range (0.1Hz to 300Hz), enabling increased accuracy and applicability on the broadest range of materials
- Flexible graphical user interface for rapid test setup, execution, and increased data analysis and reporting capabilities
- Coupled AC and DC force modulation for reliable and quantitative nanoscale dynamic characterization from the initial surface contact
- Automated testing routines for increased sample throughput
- In-situ drift correction capabilities for maximum accuracy during long test cycles